The influence of the duty ratio of the photomask for the formation of a gradient PPLN

Authors

  • Galutskiy V.V. Kuban State University, Krasnodar, Russian Federation
  • Kuzora V.F. Kuban State University, Krasnodar, Russian Federation
  • Stroganova E.V. Kuban State University, Krasnodar, Russian Federation
  • Shmargilov S.A. Kuban State University, Krasnodar, Russian Federation
  • Yakovenko N.A. Kuban State University, Krasnodar, Russian Federation

UDC

621.373

Abstract

For experimental studies of the formation of the domain structure in lithium niobate gradient was used oriented crystalline plate thickness up to 1.5 mm (the so-called z-cut, i.e. the chosen axis of the crystal perpendicular to the plane of the plate). To study the effect of duty ratio of the photomask and the system of liquid electrodes on process of formation of regular domain structures in gradient plates of lithium niobate was used a photomask in the form of eight lanes with a width of 500 μm, length 2.5 cm, total period of 30 μm and a duty cycle between 0.2 and 0.8. Analysis of the pulse shape of repolarization and the electrical current flowing in the polling and analysis of domains after etching in acid mixtures showed that the presence of a composition gradient in the crystal plates of lithium niobate optimum combination of duty cycle in the photomask is between 0.3 to 0.4. With these values of duty cycle tracks the photomask in the gradient plates of lithium niobate significant and massive violations of the period of the domain structure, due to the different speeds of growth of domain walls depending on the composition, is not observed.

Keywords:

lithium niobate, regular domain structure, polarization, duty cycle

Funding information

Работа выполнена при поддержке проектов РФФИ (16-48-230209 р_а) и 2014/75 НИР № 1291.

Author info

  • Valeriy V. Galutskiy

    канд. физ.-мат. наук, доцент кафедры оптоэлектроники Кубанского государственного университета

  • Vitaliy F. Kuzora

    аспирант кафедры оптоэлектроники Кубанского государственного университета

  • Elena V. Stroganova

    канд. физ.-мат. наук, доцент кафедры оптоэлектроники Кубанского государственного университета

  • Sergey A. Shmargilov

    аспирант кафедры оптоэлектроники Кубанского государственного университета

  • Nikolay A. Yakovenko

    д-р тех. наук, профессор, зав.кафедрой оптоэлектроники Кубанского государственного университета

References

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Issue

Pages

18-22

Section

Article

Dates

Submitted

July 19, 2016

Accepted

July 26, 2016

Published

September 30, 2016

How to Cite

[1]
Galutskiy, V.V., Kuzora, V.F., Stroganova, E.V., Shmargilov, S.A., Yakovenko, N.A., The influence of the duty ratio of the photomask for the formation of a gradient PPLN. Ecological Bulletin of Research Centers of the Black Sea Economic Cooperation, 2016, № 3, pp. 18–22.

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